IEEE Awards Booklet - 2013 - 11

2013 IEEE MEDALS

IEEE Jun-ichi Nishizawa Medal

IEEE Robert N. Noyce Medal

Sponsored by the Federation
of Electric Power Companies, Japan

Sponsored by Intel Foundation

Sunlin Chou
Youssef A El-Mansy

Burn J. Lin

For establishing a highly
effective research-development manufacturing
methodology that led to
industry leadership in logic
technology for advanced
microprocessor products

For contributions to lithographic
manufacturing, including immersion
lithography

Known for pushing the envelope in developing advanced lithography methods, Burn J. Lin's innovations have revolutionized
integrated circuit production and enabled the continued miniaturization of electronic devices. Dr. Lin's vision has consistently
provided advancements that have extended the potential of optical lithography. He pioneered immersion lithography and was the
driver of its adoption by the semiconductor industry over traditional optical lithography methods. Optical lithography is used to
delineate the circuit patterns of an integrated circuit and has enabled feature sizes of electronic devices to scale down. However,
when the industry was looking to reduce the imaging wavelength
from 197- to 157 nm to achieve the next reduction in device
feature size, Dr. Lin saw an expensive dead end with current optical lithography methods and proposed immersion lithography
in 2002. With immersion lithography, Dr. Lin demonstrated that
replacing air with water in the gap between the lens and wafer
surface provides higher resolution potential than with dry optics.
His perseverance in convincing the industry to make the change
to immersion lithography has extended Moore's Law from 40 nm
to potentially as low as 10 nm. That at least 82% of all transistors
currently in the world have been made with immersion lithography is a testament to Dr. Lin's impact. Throughout his 42-year
career in lithography, Dr. Lin pioneered deep-UV lithography,
multilayer resist systems, simulation of partially coherent images in
three dimensions, resolution and depth of focus scaling equations,
exposure-defocus window, and k1 reduction using resolution
restoration and enhancement.
An IEEE Life Fellow and member of the U.S. National Academy of Engineering, Dr. Lin's many honors include the IEEE
Cledo Brunetti Award (2009). Dr. Lin is a vice president of
Research and Development and Distinguished Fellow with the
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu.

The innovative technology development and manufacturing
methods and leadership of Sunlin Chou and Youssef A El-Mansy
propelled Intel Corporation to its position as an industry-leading
manufacturer of logic devices and accelerated advancements in
computing. Drs. Chou and El-Mansy stepped forward during the
mid-1980s to meet the challenges of high-volume and high-yield
manufacturing needed for long-term success in the microprocessor
industry. The pair developed and implemented key organizational
and process changes that transformed Intel into a logic technology
leader. Their methodology for transitioning advanced technologies to mass production enabled Intel to introduce innovations
in semiconductor processing including strained silicon, high-k/
metal gate transistors, and tri-gate transistors. The leadership of
Drs. Chou and El-Mansy played a major role in Intel's ability to
stay up to two generations ahead of competitors in rolling out
new advances. To capture manufacturing benefits from reducing
in-fabrication defects during the development stage, Drs. Chou
and El-Mansy implemented the "Copy Exactly" methodology.
With this method, the equipment and processes used at the development site in Oregon were precisely replicated at other manufacturing sites for quick production ramps with high yields. They
also established multi-generation technology pipelines in which
multiple teams worked in parallel to move innovations seamlessly
and rapidly from exploratory research through development and
into production. Using these methods, Drs. Chou and El-Mansy
led Intel in the 1990's to achieve and maintain shorter two-year
technology cycles, compared to the three-year cycles then prevalent in the industry.
A member of the U.S. National Academy of Engineering, Dr.
Chou's honors include being named to the Scientific American
list of 50 Manufacturing Business Leaders (2002). He retired from
Intel in 2005 as senior vice president and general manager of its
Technology and Manufacturing Group.
An IEEE Fellow, Dr. El-Mansy's honors include the IEEE
Frederik Philips Award (2004). He retired from Intel in 2004 as
vice president and director of logic technology development.

Scope: For outstanding contributions to material and device
science and technology, including practical application

Scope: For exceptional contributions to the microelectronics
industry

11 | 2013 IEEE AWARDS BOOKLET

Table of Contents for the Digital Edition of IEEE Awards Booklet - 2013