IEEE Awards Booklet - 2015 - 12

2015 ieee medals

IEEE Jun-ichi Nishizawa Medal

IEEE Robert N. Noyce Medal

Sponsored by the Federation of
Electric Power Companies, Japan

Sponsored by the Intel Foundation

dimitri a. antoniadis

martin a. van den Brink

For contributions to metal oxide semiconductor field-effect transistor physics,
technology, and modeling

For technical and managerial leadership
driving the continuation of optical lithography as the enabling technology for the
semiconductor industry

Known for his deep understanding of device physics, Dimitri Antoniadis has made pioneering contributions to the direction of the
integrated circuit (IC) microelectronics industry by advancing the
capabilities of metal oxide semiconductor field-effect transistors
(MOSFETS). MOSFETs are used for amplifying and switching
signals, and today's microprocessors and memory devices contain
billions of them. In 1978 while at Stanford University, Dr. Antoniadis developed the SUPREM process simulator, which was the
first computer-aided design tool for silicon semiconductor devices and ICs. SUPREM became the preeminent simulator used
by practically all IC manufacturers. His work on deep submicron
MOS devices during the 1980s was one of the first demonstrations of nano-scale MOSFETs, and his innovations have continued to the foundation of today's high-performance silicon FETs.
At MIT, Dr. Antoniadis' groundbreaking research in 1985 proved
the feasibility of sub-100-nm MOSFETs and provided the first
demonstration of source-to-channel electron injection velocities exceeding saturation velocity. Known as "velocity overshoot,"
this provides an increase in current drive in short-channel MOSFETs, enabling higher performance previously not thought attainable. His development of the virtual-source model to describe
the behavior of very short channel devices has shown the role of
high carrier velocity and mobility in obtaining maximum device
performance. With the ability to accurately simulate the characteristics of MOSFETs down to 22 nm and beyond, the model
has been adopted by the International Technology Roadmap for
Semiconductors (ITRS) for predicting the future of MOSFET
scaling. As director for 12 years of the Materials, Structures, and
Devices Center, Dr. Antoniadis has helped determine the most
promising path for future microelectronics by pursuing scaling
of MOS to its ultimate limit and interdisciplinary exploration of
new-frontier devices.
An IEEE Life Fellow and member of the U.S. National Academy of Engineering, Dr. Antoniadis is currently a professor and
the Ray and Maria Stata Chair in Electrical Engineering at the
Massachusetts Institute of Technology, Cambridge, MA, USA.

A technical and managerial trailblazer for over 3 decades, Martin
van den Brink has driven innovations in optical lithography critical to advancing Moore's Law for the continued development of
smaller and more advanced electronics. Optical lithography is a
microfabrication process in which light-sensitive chemicals are
used to transfer circuit patterns onto chip wafers, enabling mass
production of integrated circuits. One of ASML's first employees
from its start-up in 1984, Dr. van den Brink's technical direction has positioned ASML as the world's largest supplier of essential optical lithography systems for the semiconductor industry.
Dr. van den Brink has been responsible for practically all major
technical decisions at ASML. He introduced modular design and
an open innovation policy with technology and manufacturing
partners during the 1980s. In the 1990s, he was instrumental in
ASML's move from step to scan lithography. His introduction of
the TWINSCAN dual-stage architecture in 2001 provided major
improvements in productivity and accuracy. Under Dr. Van den
Brink's leadership, ASML delivered one of the most important
innovations for the continuation of Moore's Law: immersion lithography (2004), which provided a higher-resolution pattering
solution to allow continued scaling down to 40 nm. It remains
the lithography process of choice for the semiconductor industry. Dr. van den Brink has also pioneered holistic lithography for
cost-effective multiple patterning, which has enabled imaging
resolution below 20 nm. He currently oversees ASML's biggest
innovation effort to date: the introduction of extreme ultraviolet
(EUV) lithography, which will take single-exposure patterning
down to ever smaller resolutions over the next 10 years. This will
enable Moore's Law to continue for at least another decade from
a cost-effective patterning perspective.
A Royal Knight of the Order of the Dutch Lion, Dr. van
den Brink is currently president and chief technology officer of
ASML,Veldhoven, The Netherlands.

Scope: For outstanding contributions to material and device
science and technology, including practical application

Scope: For exceptional contributions to the microelectronics
industry

12 | 2015 IEEE AWARDS BOOKLET



Table of Contents for the Digital Edition of IEEE Awards Booklet - 2015

IEEE Awards Booklet - 2015 - Cover1
IEEE Awards Booklet - 2015 - Cover2
IEEE Awards Booklet - 2015 - 1
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IEEE Awards Booklet - 2015 - Cover3
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